Single Stage Homogenous Deposition of Isolated Nano particles

TL;DR

This paper presents a simple, single-stage ultrasonic humidifier method for achieving uniform, isolated nano-particle deposition on substrates, useful for nano device manufacturing.

Contribution

The study introduces a novel single-stage ultrasonic humidifier technique for homogenous nano-particle deposition, demonstrating control over particle density and distribution.

Findings

Uniform distribution of nano-diamonds on Si substrates

Controlled particle density by adjusting deposition time

No aggregation observed in deposited nano-particles

Abstract

We demonstrate that a controlled and homogenous distribution of isolated nano-particles can be achieved in deposition by employing a single stage deposition technique, utilizing a commercial ultrasonic humidifier to produce micrometer scale droplets from a suspension containing nano particles. Nano-diamonds were uniformly distributed on a Si substrate using this method. P article density was controlled by varying the deposition time. The spatial distribution of the nano particles is shown to be uniform and with no aggregation. We propose that this method can be utilized in developing mass production processes of nano devices where a homogenous sub monolayer of nano-particles is required.