Reduction of trapped ion anomalous heating by in situ surface plasma cleaning

TL;DR

This study shows that in situ plasma cleaning significantly reduces anomalous heating in trapped ion devices at room temperature, highlighting surface contaminants as a key factor, while cryogenic operation shows no improvement.

Contribution

Demonstrates a simple, effective in situ plasma cleaning method to reduce ion trap heating rates at room temperature, suggesting surface contaminants' role in motional heating.

Findings

Fourfold reduction in room-temperature heating rate after plasma cleaning

No improvement in cryogenic temperature operation, indicating thermally-activated contaminants

Surface cleaning is a gentler alternative to ion milling or laser cleaning

Abstract

Anomalous motional heating is a major obstacle to scalable quantum information processing with trapped ions. While the source of this heating is not yet understood, several previous studies suggest that surface contaminants may be largely responsible. We demonstrate an improvement by a factor of four in the room-temperature heating rate of a niobium surface electrode trap by in situ plasma cleaning of the trap surface. This surface treatment was performed with a simple homebuilt coil assembly and commercially-available matching network and is considerably gentler than other treatments, such as ion milling or laser cleaning, that have previously been shown to improve ion heating rates. We do not see an improvement in the heating rate when the trap is operated at cryogenic temperatures, pointing to a role of thermally-activated surface contaminants in motional heating whose activity may freeze out at low temperatures.