Possible atomic structures for the sub-bandgap absorption of chalcogen hyperdoped silicon
Ke-Fan Wang, Hezhu Shao, Kong Liu, Shengchun Qu, Yuanxu Wang, Zhanguo, Wang

TL;DR
This study investigates the atomic structures responsible for sub-bandgap light absorption in chalcogen hyperdoped silicon, proposing that high-energy interstitial sites of chalcogen atoms are key to this property.
Contribution
It introduces a model linking the attenuation of sub-bandgap absorptance to chemical decomposition, and suggests high-energy interstitial sites as the atomic structures responsible.
Findings
Activation energies for decomposition are quantified for S, Se, and Te hyperdoped silicon.
Arrhenius fitting accurately models the attenuation of sub-bandgap absorptance.
High-energy interstitial sites are proposed as the atomic structures responsible for absorption.
Abstract
Single-crystal silicon wafers were hyperdoped respectively by sulfur, selenium, and tellurium element using ion implantation and nanosecond laser melting. The hyperdoping of such chalcogen elements endowed the treated silicon with a strong and wide sub-bandgap light absorptance. When these hyperdoped silicons were thermally annealed even at low temperatures (such as 200~400 oC), however, this extra sub-bandgap absorptance began to attenuate. In order to explain this attenuation of absorptance, alternatively, we consider it corresponding to a chemical decomposition reaction from optically absorbing structure to non-absorbing structure, and obtain a very good fitting to the attenuated absorptances by using Arrhenius equation. Further, we extract the reaction activation energies from the fittings and they are 0.343(+/- 0.031) eV for S-, 0.426(+/-0.042) eV for Se-, and 0.317(+/-0.033) eV…
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