Chemical Vapor Deposition Synthesized Atomically Thin Molybdenum Disulfide with Optoelectronic-Grade Crystalline Quality
Ismail Bilgin, Fangze Liu, Anthony Vargas, Andrew Winchester, Michael, K.L. Man, Moneesh Upmanyu, Keshav M Dani, Gautam Gupta, Saikat Talapatra,, Aditya D. Mohite, Swastik Kar

TL;DR
This paper reports a scalable chemical vapor deposition method to synthesize high-quality, atomically thin MoS2 with optoelectronic-grade crystalline quality, enabling advanced nanoelectronic and optoelectronic applications.
Contribution
The authors developed a large-scale CVD process for high-quality monolayer MoS2 with superior crystalline and optoelectronic properties, surpassing previous methods in quality and uniformity.
Findings
Field-effect mobility exceeds 30 cm²/Vs in monolayers
High uniformity in Raman and photoluminescence mapping
Clear excitonic states observed at room temperature
Abstract
The ability to synthesize high-quality samples over large areas and at low cost is one of the biggest challenges during the developmental stage of any novel material. While chemical vapor deposition (CVD) methods provide a promising low-cost route for CMOS compatible, large-scale growth of materials, it often falls short of the high-quality demands in nanoelectronics and optoelectronics. We present large-scale CVD synthesis of single- and few- layered MoS2 using direct vapor-phase sulfurization of MoO2, which enables us to obtain extremely high-quality single-crystal monolayer MoS2 samples with field-effect mobility exceeding 30 cm2/Vs in monolayers. These samples can be readily synthesized on a variety of substrates, and demonstrate a high-degree of optoelectronic uniformity in Raman and photoluminescence mapping over entire crystals with areas exceeding hundreds of square micrometers.…
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