Epsilon-Near-Zero Al-Doped ZnO for Ultrafast Switching at Telecom Wavelengths: Outpacing the Traditional Amplitude-Bandwidth Trade-Off
N. Kinsey, C. DeVault, J. Kim, M. Ferrera, V. M. Shalaev, and A., Boltasseva

TL;DR
This paper demonstrates epsilon-near-zero AZO thin films with ultrafast carrier dynamics and significant reflectance modulation at telecom wavelengths, enabling high-speed nanophotonic switching beyond traditional trade-offs.
Contribution
It introduces the first epsilon-near-zero AZO films with sub-1 ps carrier dynamics and high modulation depth, fabricated via a low-temperature process for ultrafast optical switching.
Findings
Carrier excitation and recombination times below 1 ps
Reflectance modulation up to 40% at 1.3 μm
All-optical plasmonic modulator operating at THz frequencies
Abstract
Transparent conducting oxides have recently gained great attention as CMOS-compatible materials for applications in nanophotonics due to their low optical loss, metal-like behavior, versatile/tailorable optical properties, and established fabrication procedures. In particular, aluminum doped zinc oxide (AZO) is very attractive because its dielectric permittivity can be engineered over a broad range in the near infrared and infrared. However, despite all these beneficial features, the slow (> 100 ps) electron-hole recombination time typical of these compounds still represents a fundamental limitation impeding ultrafast optical modulation. Here we report the first epsilon-near-zero AZO thin films which simultaneously exhibit ultra-fast carrier dynamics (excitation and recombination time below 1 ps) and an outstanding reflectance modulation up to 40% for very low pump fluence levels (< 4…
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Taxonomy
TopicsPlasmonic and Surface Plasmon Research · Photonic and Optical Devices · Optical Coatings and Gratings
