Effect of phantom dark energy on the holographic thermalization
Xiao-Xiong Zeng, Xin-Yun Hu, Li-Fang Li

TL;DR
This study explores how phantom dark energy influences the thermalization process in holographic models, revealing that dark energy parameters and chemical potential significantly affect the rate and ease of plasma thermalization.
Contribution
It provides a novel analysis of the impact of phantom dark energy on holographic thermalization, including the effects of chemical potential and fitting functions for thermalization dynamics.
Findings
Smaller dark energy parameter facilitates easier plasma thermalization.
Higher chemical potential makes plasma thermalization more difficult.
Derived fitting functions for thermalization curves and analyzed velocities and accelerations.
Abstract
Gravitational collapse of a shell of charged dust surrounded by the phantom dark energy is probed by the minimal area surface, which is dual to probe the thermalization in the boundary quantum field by expectation values of Wilson loop in the framework of the AdS/CFT correspondence. We investigated mainly the effect of the phantom dark energy parameter and chemical potential on the thermalization. The result shows that the smaller the phantom dark energy parameter is, the easier the plasma thermalizes as the chemical potential is fixed, and the larger the chemical potential is, the harder the plasma thermalizes as the dark energy parameter is fixed. We get the fitting function of the thermalization curve and with it, the thermalization velocity and thermalization acceleration are discussed.
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