Hole-induced insulator-to-metal transition in La1-xSrxCrO3 epitaxial films
K.H.L Zhang, Y. Du, P. V. Sushko, M. E. Bowden, V. Shutthanandan, S., Sallis, L.F.J. Piper, S.A. Chambers

TL;DR
This study investigates how doping LaCrO3 with Sr induces an insulator-to-metal transition in epitaxial films, revealing the electronic structure evolution and the importance of epitaxial strain.
Contribution
It provides a comprehensive experimental and theoretical analysis of the electronic transition in La1-xSrxCrO3 films, highlighting the role of epitaxial strain and doping.
Findings
Insulator-to-metal transition occurs at x ≥ 0.65 under in-plane compression.
Doping causes Fermi level to shift toward valence band maximum.
Electronic structure changes are well described by DFT + U calculations.
Abstract
We have investigated the evolution of the electronic properties of La1-xSrxCrO3 (for the full range of x) epitaxial films deposited by molecular beam epitaxy (MBE) using x-ray diffraction, x-ray photoemission spectroscopy, Rutherford backscattering spectrometry, x-ray absorption spectroscopy, electrical transport, and ab initio modeling. LaCrO3 is an antiferromagnetic insulator whereas SrCrO3 is a metal. Substituting Sr2+ for La3+ in LaCrO3 effectively dopes holes into the top of valence band, leading to Cr4+ (3d2) local electron configurations. Core-level and valence-band features monotonically shift to lower binding energy with increasing x, indicating downward movement of the Fermi level toward the valence band maximum. The material becomes a p-type semiconductor at lower doping levels and an insulator-to-metal transition is observed at x greater than or equal to 0.65, but only when…
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