Electronic depth profiles with atomic layer resolution from resonant soft x-ray reflectivity
M. Zwiebler, J. E. Hamann-Borrero, M. Vafaee, P. Komissinskiy, S., Macke, R. Sutarto, F. He, B. B\"uchner, G. A. Sawatzky, L. Alff, J. Geck

TL;DR
This paper introduces a novel method for analyzing resonant soft x-ray reflectivity data that accounts for atomic-scale variations in optical properties, enabling atomic-resolution depth profiling of heterostructures.
Contribution
The authors develop a slicing scheme that models heterostructures at atomic layer resolution, improving the analysis of resonant soft x-ray reflectivity data.
Findings
Allows determination of atomic-scale interface structures
Enables depth-resolved spectroscopic analysis with atomic resolution
Enhances understanding of surface and interface phenomena
Abstract
The analysis of x-ray reflectivity data from artificial heterostructures usually relies on the homogeneity of optical properties of the constituent materials. However, when the x-ray energy is tuned to an absorption edge, this homogeneity no longer exists. Within the same material, spatial regions containing elements at resonance will have optical properties very different from regions without resonating sites. In this situation, models assuming homogeneous optical properties throughout the material can fail to describe the reflectivity adequately. As we show here, resonant soft x-ray reflectivity is sensitive to these variations, even though the wavelength is typically large as compared to the atomic distances over which the optical properties vary. We have therefore developed a scheme for analyzing resonant soft x-ray reflectivity data, which takes the atomic structure of a material…
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