Charge transport in amorphous Hf$_{0.5}$Zr$_{0.5}$O$_2$
D. R. Islamov (1, 2), T. V. Perevalov (1, 2), V. A. Gritsenko (1, and 2), C. H. Cheng (3), A. Chin (4) ((1) Rzhanov Institute of Semiconductor, Physics SB RAS, (2) Novosibirsk State University, (3) National Taiwan Normal, University, (4) National Chiao Tung University)

TL;DR
This paper investigates charge transport in amorphous Hf$_{0.5}$Zr$_{0.5}$O$_2$, demonstrating phonon-assisted tunneling between traps and identifying trap energies through experimental and theoretical analysis.
Contribution
It provides the first combined experimental and theoretical analysis of charge transport mechanisms in amorphous Hf$_{0.5}$Zr$_{0.5}$O$_2$, highlighting phonon-assisted tunneling and trap energies.
Findings
Thermal trap energy of 1.25 eV identified.
Optical trap energy of 2.5 eV identified.
Oxygen vacancies hypothesized as charge transport centers.
Abstract
In this study, we demonstrated experimentally and theoretically that the charge transport mechanism in amorphous HfZrO is phonon-assisted tunneling between traps like in HfO and ZrO. The thermal trap energy of 1.25 eV and optical trap energy of 2.5 eV in HfZrO were determined based on comparison of experimental data on transport with different theories of charge transfer in dielectrics. A hypothesis that oxygen vacancies are responsible for the charge transport in HfZrO was discussed.
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