Energy flux pattern of inverse Goos-Hanchen shift in photonic crystals with negative index of refraction

TL;DR

This paper investigates the energy flux patterns associated with the inverse Goos-Hanchen shift in negatively refractive photonic crystals, revealing polarization-dependent behaviors and how surface termination influences the energy flux and shift magnitude.

Contribution

It provides new insights into the polarization-dependent energy flux patterns and control mechanisms of inverse GH shift in NRPhCs with different surface terminations.

Findings

Inverse GH shift occurs in both TM and TE polarizations in NRPhCs.

Energy flux localization varies with polarization and surface termination.

Surface truncation can control the inverse GH shift magnitude.

Abstract

The energy flux patterns of inverse Goos-Hanchen (GH) shift around the interface between air and negatively refractive photonic crystal (NRPhC) with different surface terminations is investigated. Results show that NRPhC exhibits inverse GH shift in TM and TE polarization, and the localization and pattern of energy flux differ in TM and TE polarizations and are strongly affected by surface termination. This is different to the condition of negative permittivity materials (i.e., metal), which only presents inverse GH shift in TM polarization. In the case of TE polarization, the energy flux pattern exhibits the flux of backward wave whose localization changes from the surface to inside of NRPhC with the variation of surface termination. In the case of TM polarization, the energy flux pattern is always confined within the surface of NRPhC, whereas its pattern changes from the flux of backward wave to vortices at the surface of NRPhC, which is different to the energy flux of TM polarization of metal. By properly truncating the surface of NRPhC we can control the magnitude of inverse GH shift for TM and TE polarized light.