Growth of Ca$_2$MnO$_4$ Ruddlesden-Popper structured thin films using Combinatorial Substrate Epitaxy
M. Lacotte, A. David, D. Pravarthana, C. grygiel, G.S rohrer, PA., Salvador, M. Velasquez, K. de Kloe, W. Prellier

TL;DR
This study investigates the epitaxial growth of Ca$_2$MnO$_4$ thin films on polycrystalline substrates using combinatorial substrate epitaxy, revealing dominant orientation relationships and demonstrating the method's potential for complex oxide synthesis.
Contribution
It identifies primary orientation relationships in RP heteroepitaxy and showcases the effectiveness of combinatorial substrate epitaxy for high-throughput oxide film growth.
Findings
Three main orientation relationships describe nearly all grain pairs.
Optimal growth temperature is around 750°C based on diffraction quality.
Few orientation relationships are needed to characterize RP heteroepitaxy.
Abstract
The local epitaxial growth of pulsed laser deposited CaMnO films on polycrystalline spark plasma sintered SrTiO substrates was investigated to determine phase formation and preferred epitaxial orientation relationships () for isostructural Ruddlesden-Popper (RP) heteroepitaxy, further developing the high-throughput synthetic approach called Combinatorial Substrate Epitaxy (CSE). Both grazing incidence X-ray diffraction and electron backscatter diffraction (EBSD) patterns of the film and substrate were indexable as single-phase RP-structured compounds. The optimal growth temperature (between 650 C and 800 C) was found to be 750 C using the maximum value of the average image quality (IQ) of the backscattered diffraction patterns. Films grew in a grain-over-grain pattern such that each CaMnO grain had a single with the…
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