Semiconductor to metal transition in bilayer phosphorene under normal compressive strain
Aaditya Manjanath, Atanu Samanta, Tribhuwan Pandey, and Abhishek K., Singh

TL;DR
This study demonstrates that applying normal compressive strain to bilayer phosphorene induces a reversible transition from semiconductor to metal at around 13.35% strain, enabling tunable electronic properties without degrading transport characteristics.
Contribution
It reveals a practical method to tune electronic properties of bilayer phosphorene via normal compressive strain, which is easier to implement experimentally compared to previous approaches.
Findings
Semiconductor to metal transition at ~13.35% strain
Direct to indirect bandgap transition at ~3% strain
Structural integrity maintained at high strain levels
Abstract
Phosphorene, a two-dimensional (2D) analog of black phosphorous, has been a subject of immense interest recently, due to its high carrier mobilities and a tunable bandgap. So far, tunability has been predicted to be obtained with very high compressive/tensile in-plane strains, and vertical electric field, which are difficult to achieve experimentally. Here, we show using density functional theory based calculations the possibility of tuning electronic properties by applying normal compressive strain in bilayer phosphorene. A complete and fully reversible semiconductor to metal transition has been observed at strain, which can be easily realized experimentally. Furthermore, a direct to indirect bandgap transition has also been observed at strain, which is a signature of unique band-gap modulation pattern in this material. The absence of negative frequencies in…
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