A multi-scale approach to the electronic structure of doped semiconductor surfaces
Ofer Sinai, Oliver T. Hofmann, Patrick Rinke, Matthias Scheffler,, Georg Heimel, Leeor Kronik

TL;DR
This paper introduces CREST, a novel multi-scale method for simulating doped semiconductor surfaces that effectively models space-charge regions without requiring unrealistic doping levels, validated through tight-binding and DFT calculations.
Contribution
The paper presents CREST, a new technique extending pseudoatom approaches by incorporating excess charge and counter-charge sheets, enabling accurate simulations of doped surfaces at realistic doping levels.
Findings
CREST accurately models space-charge regions in doped semiconductors.
Application to Si(111) reveals doping-dependent electronic structure changes.
Method compatible with standard electronic structure codes.
Abstract
The inclusion of the global effects of semiconductor doping poses a unique challenge for first-principles simulations, because the typically low concentration of dopants renders an explicit treatment intractable. In systems which do not display long-range band bending, a satisfactory remedy is offered by the use of "pseudoatoms", with a fractional nuclear charge matching the bulk doping concentration. However, this alone is not always sufficient for charged surfaces, where the width of the space-charge region (SCR) often exceeds realistic supercell dimensions. One generalization of the pseudoatom approach which overcomes this difficulty relies on the introduction of an artificially high doping level within a slab calculation, in conjunction with a multi-scale electrostatic energy correction. Here, we present an alternative technique that naturally extends the pseudoatom approach while…
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Taxonomy
TopicsSurface and Thin Film Phenomena
