Nanomorphology of Annealed P3HS and P3HS:PCBM Films for OPV Applications
Samuele Lilliu, Mejd Alsari, Marcus S. Dahlem, J. Emyr Macdonald
TL;DR
This study investigates the nanomorphology of P3HS and P3HS:PCBM films using AFM and GI-XRD, highlighting how molecular weight, regioregularity, and thermal annealing influence film structure for OPV applications.
Contribution
It provides detailed nanomorphological characterization of P3HS and its blends with PCBM, emphasizing the effects of molecular weight, regioregularity, and annealing on film structure.
Findings
Higher molecular weight and regioregularity affect film nanomorphology.
Thermal annealing at 250°C alters the nanostructure of the films.
AFM and GI-XRD reveal morphological differences before and after annealing.
Abstract
Atomic Force Microscopy (AFM) and Grazing Incidence X-Ray Diffraction (GI-XRD) are used to characterize the nanomorphology of spin-coated low (LMW, Mn = 12 kg/mol, regioregularity RR = 84%) and high (HMW, Mn = 39 kg/mol, RR = 98%) molecular weight poly(3-hexylselenophene) (P3HS) films and blend films of P3HS with [6,6]-phenyl-C61-butyric acid methyl ester (PCBM), before and after thermal annealing at 250 {\deg}C.
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsOrganic Electronics and Photovoltaics · Conducting polymers and applications · Organic Light-Emitting Diodes Research