Diamond Nanophotonic Circuits Functionalized by Dip-pen Nanolithography

TL;DR

This paper presents the fabrication of diamond nanophotonic circuits functionalized with dip-pen nanolithography, enabling precise surface modification and multicolor fluorescence coupling across visible wavelengths.

Contribution

It introduces a novel method for site-specific functionalization of diamond nanophotonics using dip-pen nanolithography with high spatial resolution.

Findings

Successful fabrication of diamond nanophotonic circuits covering visible spectrum

Effective surface functionalization with minimum linewidth of 100 nm

Coupling of multicolor fluorescence into photonic network

Abstract

Nanophotonic circuits based on polished diamond thin films are prepared. These circuits cover a wide wavelength range across the entire visible spectrum. Integrated devices are surface functionalized site-specifically and in parallel using dip-pen nanolithography with a minimum linewidth of 100 nm. Multicolor fluorescence is coupled into the underlying photonic network using microring resonators and grating structures.