Sub-micron period lattice structures of magnetic microtraps for ultracold atoms on an atom chip

TL;DR

This paper presents the design, fabrication, and characterization of sub-micron period magnetic nanostructures on an atom chip, enabling ultracold atom trapping for quantum experiments with novel lattice geometries.

Contribution

It introduces a new method for creating sub-micron magnetic lattices using Co/Pd multilayered films and high-precision lithography, expanding capabilities for quantum simulation.

Findings

Successfully fabricated magnetic nanostructures with sub-micron periods.

Demonstrated magnetic trapping of ultracold $^{87}$Rb atoms.

Enabled new lattice geometries for quantum tunneling experiments.

Abstract

We report on the design, fabrication and characterization of magnetic nanostructures to create a lattice of magnetic traps with sub--micron period for trapping ultracold atoms. These magnetic nanostructures were fabricated by patterning a Co/Pd multilayered magnetic film grown on a silicon substrate using high precision e-beam lithography and reactive ion etching. The Co/Pd film was chosen for its small grain size and high remanent magnetization and coercivity. The fabricated structures are designed to magnetically trap $^{87}$Rb atoms above the surface of the magnetic film with 1D and 2D (triangular and square) lattice geometries and sub-micron period. Such magnetic lattices can be used for quantum tunneling and quantum simulation experiments, including using geometries and periods that may be inaccessible with optical lattice.