Electrical and optical properties of ITO thin films prepared by DC magnetron sputtering for low-emitting coatings

TL;DR

This study explores how DC magnetron sputtering parameters affect the electrical and optical properties of ITO thin films, aiming to optimize low-emissivity coatings with high infrared reflectance and visible transparency.

Contribution

It provides an optimized sputtering process for producing low-e ITO coatings with specific electrical and optical characteristics, focusing on the effects of sputtering power and oxygen flow.

Findings

Achieved 89.5% infrared reflectance in the 3-25 micron range.

Obtained approximately 85% visible transparency.

Produced coatings with emittance less than 11%.

Abstract

Optimized DC magnetron sputtering system for the deposition of transparent conductive oxides (TCOs), such indium tin oxide (ITO) on glass substrate has been applied in order to achieve low-emitting (low-e) transparent coatings. To obtain the concerned electrical resistance and high infrared reflection, first the effect of applied sputtering power then oxygen flow on the properties of films have been investigated. The other depositions parameters are kept constant. Film deposition at at temperature 400 degree of Celsius in oxygen flow of 3 Standard Cubic Centimeters per Minute results in transparent and infrared reflecting coatings. Under this condition the highest attained average reflectance in the infrared is ({\lambda}=3-25 micron) 89.5% (lowest emittance equals to less than 11%), whereas transparency in the visible is 85% approximately. Plasma wavelength and carrier concentration was measured.