Near field thermal memory device
S. A. Dyakov, J. Dai, M. Yan, M. Qiu

TL;DR
This paper introduces a near-field thermal memory device utilizing radiative bistability in a system of SiO₂ and VO₂ plates, achieving rapid switching due to near-field photon tunneling, with potential for fast thermal memory applications.
Contribution
The paper presents the concept and demonstration of a near-field thermal memory device based on radiative bistability in a SiO₂-VO₂ system, with significantly reduced switching time.
Findings
Switching time of 5 ms due to near-field effects
VO₂ exhibits two thermodynamical steady-states
Fast switching enabled by near-field photon tunneling
Abstract
We report the concept of a near-field memory device based on the radiative bistability effect in the system of two closely separated parallel plates of SiO and VO which exchange heat by thermal radiation in vacuum. We demonstrate that the VO plate, having metal-insulator transition at 340 K, has two thermodynamical steady-states. One can switch between the states using an external laser impulse. We show that due to near-field photon tunneling between the plates, the switching time is found to be only 5 ms which is several orders lower than in case of far field.
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Taxonomy
TopicsPhase-change materials and chalcogenides · Semiconductor Quantum Structures and Devices · Thermal properties of materials
