Inductance of Circuit Structures for MIT LL Superconductor Electronics Fabrication Process with 8 Niobium Layers
Sergey K. Tolpygo, Vladimir Bolkhovsky, T.J. Weir, C.J. Galbraith,, Leonard M. Johnson, Mark A. Gouker, and Vasili K. Semenov

TL;DR
This paper experimentally evaluates the inductance of superconducting thin-film structures with submicron linewidths fabricated using an 8-layer niobium process, demonstrating high reproducibility and insights into miniaturization for high-density circuits.
Contribution
It provides detailed measurements of inductance in superconducting structures with submicron linewidths and compares experimental data with numerical models, advancing miniaturization techniques.
Findings
Inductance per unit length increases as linewidth decreases into the submicron range.
Linewidth reduction does not increase parameter spread, maintaining uniformity.
Good agreement between experimental results and numerical inductance extraction methods.
Abstract
Inductance of superconducting thin-film inductors and structures with linewidth down to 250 nm has been experimentally evaluated. The inductors include various striplines and microstrips, their 90-degree bends and meanders, interlayer vias, etc., typically used in superconducting digital circuits. The circuits have been fabricated by a fully planarized process with 8 niobium layers, developed at MIT Lincoln Laboratory for very-large-scale superconducting integrated circuits. Excellent run-to-run reproducibility and inductance uniformity of better than 1% across 200-mm wafers have been found. It has been found that the inductance per unit length of stripline and microstrip line inductors continues to grow as the inductor linewidth is reduced deep into the submicron range to the widths comparable to the film thickness and magnetic field penetration depth. It is shown that the linewidth…
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