Low-temperature illumination and annealing of ultra-high quality quantum wells
Mohammad Samani, Alexander V. Rossokhaty, Ebrahim Sajadi, Silvia, L\"uscher, Joshua A. Folk, John D. Watson, Geoffrey C. Gardner, Michael J., Manfra

TL;DR
This study explores how low-temperature illumination and annealing affect the fractional quantum Hall properties of ultra-high quality GaAs/AlGaAs quantum wells, leading to improved energy gaps and reproducible states.
Contribution
It introduces a novel illumination and annealing procedure that enhances FQH characteristics and achieves a significant energy gap for the 5/2 state.
Findings
Illumination reduces electron density by over an order of magnitude.
Annealing restores original density and improves FQH features.
Achieved a 600 mK energy gap for the 5/2 state.
Abstract
The effects of low temperature illumination and annealing on fractional quantum Hall (FQH) characteristics of a GaAs/AlGaAs quantum well are investigated. Illumination alone, below 1 K, decreases the density of the 2DEG electrons by more than an order of magnitude and resets the sample to a repeatable initial state. Subsequent thermal annealing at a few Kelvin restores the original density and dramatically improves FQH characteristics. A reliable illumination and annealing recipe is developed that yields an energy gap of 600 mK for the 5/2 state.
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