2D full-band, Atomistic Quantum transport in L-shaped Vertical InSb/InAsn-TFETs
Bhupesh Bishnoi, Bahniman Ghosh

TL;DR
This paper investigates the quantum transport properties of 2D L-shaped InSb/InAsn-TFETs with a full-band atomistic simulation, focusing on device performance metrics like subthreshold swing and ON/OFF current ratios.
Contribution
It introduces a detailed 3D atomistic NEGF simulation approach for analyzing complex L-shaped TFET geometries with full-band quantum effects.
Findings
L-shaped InSb/InAsn-TFETs show promising low subthreshold swing.
Device performance depends on oxide thickness, gate length, and other parameters.
Quantum transport modeling captures detailed electron-hole behavior in complex geometries.
Abstract
In the present work, we have investigated the performances of L shaped Vertical broken bandgapheterostructureInSb InAsn-channel tunnel field effect transistors TFETs of 4 nm thin channel structures with the gate lengths of 20nm. We have used a 3D full band, quantum mechanical simulator based on atomistic sp3d5s spin-orbital coupled tight binding method.In this L shaped nonlinear geometry the gate electric field and tunnel junction internal field are oriented in same direction. A broken narrow bandgap BG structure has another advantage that transport is by mixture of electrons holes. TFETs are promising devices for lowpower logic design due to low subthreshold swing SS and high Ion Ioff ratio. We investigate current voltage characteristics, ON current OFF current andsubthreshold swing as function of equivalent oxide thickness, gate length, drain length, gate undercut, High K, and drain…
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Taxonomy
TopicsAdvancements in Semiconductor Devices and Circuit Design · Semiconductor materials and devices · Nanowire Synthesis and Applications
