Nanolithography using counter-propagating light-sheets

TL;DR

This paper introduces a laser interference nano-lithography method using counter-propagating light-sheets, enabling efficient fabrication of nano-structures with sub-100 nm features for applications in nanotechnology fields.

Contribution

The paper presents a novel nano-lithography technique based on counter-propagating light-sheets, overcoming point-scanning limitations and facilitating mass production of nano-structures.

Findings

Achieved nano-bump structures with 60 nm feature size

Inter-nanobump separation of 180 nm demonstrated

Technique suitable for applications in plasmonics, nanophotonics, and nanobiology

Abstract

We propose a laser interference nano-lithography technique for fabrication of nano-structures. This is inspired by a 2pi-illumination system that consists of two cylindrical lens arranged face-to-face at a distance 2f with a common geometrical focus. When illuminated by a coherent light, this results in the super-position of two counter-propagating light-sheets. The interference gives rise to nano-bump structures along the optical axis. This technique overcomes the existing point-scanning techniques and paves the way for mass production of nano-structures. Study shows the structures with a feature size of 60 nm and an inter-nanobump separation of 180 nm. Proposed technique may find applications in plasmonics, nanophotonics and nanobiology.