Thermal transport properties of metal/MoS2 interfaces from first principles
Rui Mao, Byoung Don Kong, and Ki Wook Kim

TL;DR
This study investigates the thermal transport at metal/MoS2 interfaces using first-principles calculations and phonon transport models, revealing how interfacial microstructure influences thermal resistance.
Contribution
It provides a detailed atomistic analysis of how different bonding types and atomic arrangements affect thermal transfer at metal/MoS2 interfaces, a comparison not extensively explored before.
Findings
Chemisorbed interfaces have lower thermal resistance than physisorbed.
Metal/MoS2 interfaces are more resistive than metal/graphene.
Atomic plane arrangements and bonding patterns are key to thermal resistance.
Abstract
Thermal transport properties at the metal/MoS2 interfaces are analyzed by using an atomistic phonon transport model based on the Landauer formalism and first-principles calculations. The considered structures include chemisorbed Sc(0001)/MoS2 and Ru(0001)/MoS2, physisorbed Au(111)/MoS2, as well as Pd(111)/MoS2 with intermediate characteristics. Calculated results illustrate a distinctive dependence of thermal transfer on the details of interfacial microstructures. More specifically, the chemisorbed case with a stronger bonding exhibits a generally smaller interfacial thermal resistance than the physisorbed. Comparison between metal/MoS2 and metal/graphene systems suggests that metal/MoS2 is significantly more resistive. Further examination of lattice dynamics identifies the presence of multiple distinct atomic planes and bonding patterns at the interface as the key origin of the…
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