Nanomechanical morphology of amorphous, transition, and crystalline domains in phase change memory thin films
James L. Bosse, Ilya Grishin, Bryan D. Huey, Oleg V. Kolosov

TL;DR
This study uses advanced nanomechanical imaging to analyze the amorphous, transition, and crystalline phases in phase change memory thin films, revealing detailed 3D morphological and stiffness variations crucial for memory device development.
Contribution
It introduces a combined surface and cross-section ultrasonic force microscopy approach for 3D nanomechanical mapping of phase change materials at nanoscale resolution.
Findings
Nucleation occurs at PCM-substrate and free film interfaces.
Stiffness contrast between phases is 14-20%.
Subsurface structures depend on sputtering direction.
Abstract
In the search for phase change materials (PCM) that may rival traditional random access memory, a complete understanding of the amorphous to crystalline phase transition is required. For the well-known Ge2Sb2Te5 (GST) and GeTe (GT) chalcogenides, which display nucleation and growth dominated crystallization kinetics, respectively, this work explores the nanomechanical morphology of amorphous and crystalline phases in 50 nm thin films. Subjecting these PCM specimens to a lateral thermal gradient spanning the crystallization temperature allows for a detailed morphological investigation. Surface and depth-dependent analyses of the resulting amorphous, transition and crystalline regions are achieved with shallow angle cross-sections, uniquely implemented with beam exit Ar ion polishing. To resolve the distinct phases, ultrasonic force microscopy (UFM) with simultaneous topography is…
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