Controlled Growth of a Line Defect in Graphene and Implications for Gate-Tunable Valley Filtering
J.-H. Chen, G. Aut\`es, N. Alem, F. Gargiulo, A. Gautam, M. Linck, C., Kisielowski, O. V. Yazyev, S. G. Louie, A. Zettl

TL;DR
This paper presents a method for creating precise 5-5-8 line defects in graphene using electron irradiation and Joule heating, demonstrating their potential for valley filtering and valleytronics applications.
Contribution
It introduces a controlled fabrication technique for graphene line defects and explores their valley filtering capabilities through first-principles calculations.
Findings
Successful fabrication of regular 5-5-8 line defects in graphene.
Strong energy-dependent valley polarization across the defect.
Proposal of a valley valve device for valleytronics.
Abstract
Atomically precise tailoring of graphene can enable unusual transport pathways and new nanometer-scale functional devices. Here we describe a recipe for the controlled production of highly regular "5-5-8" line defects in graphene by means of simultaneous electron irradiation and Joule heating by applied electric current. High-resolution transmission electron microscopy reveals individual steps of the growth process. Extending earlier theoretical work suggesting valley-discriminating capabilities of a graphene 5-5-8 line defect, we perform first-principles calculations of transport and find a strong energy dependence of valley polarization of the charge carriers across the defect. These findings inspire us to propose a compact electrostatically gated "valley valve" device, a critical component for valleytronics.
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