Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region

TL;DR

This paper presents a waveguide-mode interference lithography technique that enables the fabrication of high contrast, subwavelength 1D, 2D, and 3D structures in the visible spectrum, including resonant split tube patterns.

Contribution

The study introduces a novel WMIL method for creating high contrast subwavelength structures in the visible range, demonstrating new 3D checkerboard patterns and resonance effects.

Findings

Successful fabrication of high contrast resist masks using TM1 waveguide mode

Demonstration of 1D, 2D, and 3D subwavelength patterns

Experimental observation of resonance at 1.9 eV in split tube structures

Abstract

We explore possibilities of waveguide-mode interference lithography (WMIL) technique for high contrast subwavelength structures in the visible region. Selecting an appropriate waveguide-mode, we demonstrate high contrast resist mask patterns for the first time. TM1 mode in the waveguide is shown to be useful for providing a three-dimensional structure whose cross section is checkerboard pattern. Applying our WMIL technique, we demonstrate 1D, 2D and 3D subwavelength resist patterns that are widely used for the fabrication of metamteterials in the visible region. In addition to the resist patterns, we demonstrate a resonance at 1.9 eV for a split tube structure experimentally.