Effect of high pressure annealing on the normal state transport of LaO0.5F0.5BiS2
I. Pallecchi, G. Lamura, M. Putti, J. Kajitani, Y. Mizuguchi, O., Miura, S. Demura, K. Deguchi, Y. Takano

TL;DR
This study investigates how high pressure annealing influences the electrical, thermoelectrical, and thermal transport properties of LaO0.5F0.5BiS2, revealing significant changes in charge carrier behavior and electronic structure.
Contribution
It demonstrates the impact of high pressure annealing on the transport properties and electronic structure of BiS2-based compounds, highlighting the role of preparation conditions in tuning superconducting and normal state behaviors.
Findings
High pressure annealing reduces resistivity and Hall resistance, indicating increased electron carrier density.
Sign inversion of Hall resistance suggests a multiband electronic structure affected by annealing.
Doped samples show much lower resistivity and carrier densities compared to undoped samples.
Abstract
We study normal state electrical, thermoelectrical and thermal transport in polycrystalline BiS2-based compounds, which become superconducting by F doping on the O site. In particular we explore undoped LaOBiS2 and doped LaO0.5F0.5BiS2 samples, prepared either with or without high pressure annealing, in order to evidence the roles of doping and preparation conditions. The high pressure annealed sample exhibits room temperature values of resistivity ro around 5 mohmcm, Seebeck coefficient S around -20 microV/K and thermal conductivity k around 1.5 W/Km, while the Hall resistance RH is negative at all temperatures and its value is -10-8 m3/C at low temperature. The sample prepared at ambient pressure exhibits RH positive in sign and five times larger in magnitude, and S negative in sign and slightly smaller in magnitude. These results reveal a complex multiband evolution brought about by…
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