Vacuum Technology for Ion Sources
P. Chiggiato (CERN)
TL;DR
This paper reviews vacuum technology principles for ion sources, focusing on pressure profiles, pumping techniques, and introduces simulation tools like Molflow+ for analyzing vacuum behavior, with a case study on the Linac4 H- source.
Contribution
It presents a comprehensive overview of vacuum technology for ion sources and introduces simulation methods for pressure analysis, including a case study on Linac4 H- source.
Findings
Monte Carlo code Molflow+ effectively evaluates conductances.
Vacuum-electrical analogy aids in calculating pressure variations.
Application to Linac4 H- source demonstrates practical relevance.
Abstract
The basic notions of vacuum technology for ion sources are presented, with emphasis on pressure profile calculation and choice of pumping technique. A Monte Carlo code (Molflow+) for the evaluation of conductances and the vacuum-electrical analogy for the calculation of time-dependent pressure variations are introduced. The specific case of the Linac4 H- source is reviewed.
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsScientific Measurement and Uncertainty Evaluation · Mass Spectrometry Techniques and Applications · Plasma Diagnostics and Applications