Skybridge: 3-D Integrated Circuit Technology Alternative to CMOS
Mostafizur Rahman, Santosh Khasanvis, Jiajun Shi, Mingyu Li, and Csaba, Andras Moritz

TL;DR
Skybridge is a novel 3-D integrated circuit technology that overcomes CMOS scaling limitations, offering significant improvements in density, performance, power efficiency, and thermal management for future ICs.
Contribution
The paper introduces Skybridge, a comprehensive 3-D IC fabric technology that integrates device, circuit, and manufacturing innovations for scalable, high-performance, and thermally manageable ICs.
Findings
30-60x higher density than 16-nm CMOS
3.5x better performance per watt
10x reduction in interconnect lengths
Abstract
Continuous scaling of CMOS has been the major catalyst in miniaturization of integrated circuits (ICs) and crucial for global socio-economic progress. However, scaling to sub-20nm technologies is proving to be challenging as MOSFETs are reaching their fundamental limits and interconnection bottleneck is dominating IC operational power and performance. Migrating to 3-D, as a way to advance scaling, has eluded us due to inherent customization and manufacturing requirements in CMOS that are incompatible with 3-D organization. Partial attempts with die-die and layer-layer stacking have their own limitations. We propose a 3-D IC fabric technology, Skybridge[TM], which offers paradigm shift in technology scaling as well as design. We co-architect Skybridge's core aspects, from device to circuit style, connectivity, thermal management, and manufacturing pathway in a 3-D fabric-centric manner,…
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Taxonomy
TopicsSemiconductor materials and devices · 3D IC and TSV technologies · Integrated Circuits and Semiconductor Failure Analysis
