Graphene Oxide flakes: methods and techniques for properties at interfaces

TL;DR

This paper presents a combined spectroscopy and microscopy approach to precisely characterize and control the local properties of Graphene Oxide interfaces, crucial for optimizing photonic and electronic device performance.

Contribution

It introduces a method combining Near Edge X-ray Absorption Fine Structure Spectroscopy and Conductive Atomic Force Microscopy for detailed interface analysis of Graphene Oxide-based materials.

Findings

The approach links chemical and physical properties to morphology and conductance.

Application to GO/Au and GO/SiO2 demonstrates detailed interface characterization.

Method enables local property control for device optimization.

Abstract

Graphene Oxide and reduced Graphene Oxide are intriguing materials for photonics and electronic devices both for intrinsic characteristics and as precursors for the synthesis of graphene. Whatever the application and the engineering purpose, a fine control of the chemical and physical properties is required since the performances of graphene based systems depend on the reduction state of Graphene Oxide and can be strongly affected by interfaces interactions and neighboring effects. Then, a method for a local control of electric, electronic and chemical properties is required. The synergic application of Near Edge X ray Absorption Fine Structure Spectroscopy and Conductive Atomic Force Microscopy is a powerful way for such purpose allowing a full characterization of simple and composite samples, including specimens with dielectric discontinuities. Graphene Oxide/Gold (GO/Au) and Graphene Oxide/Silicon Oxide (GO/SiO2) have been selected as proof by example. The results show that the approach allow to relate chemical, electronic and physical properties to morphological features and local conductance behavior.