Design and Simulation of Symmetric Nanostructures Using Two-Beam Modulated Interference Lithography Technique

TL;DR

This paper presents the simulation and design of symmetric nanostructures using a two-beam interference lithography method, optimizing pattern parameters for high-throughput, uniform, and controllable nanofabrication.

Contribution

It introduces a MATLAB-based simulation approach for designing 1D, 2D, and 3D nanostructures via two-beam interference, enabling parameter optimization for nanolithography.

Findings

Patterns depend on interference intensity, wavelength, slit separation, and incident angle.

Optimized parameters yield controlled periodicity, density, and aspect ratio.

The method offers high uniformity, throughput, and process control.

Abstract

Laser Interference Lithography (LIL) is a versatile fabrication method for patterning sub-micron structures in arrays covering large areas. It is a facile and fast mask-less lithography process to produce large area periodic patterns. The objective in this study is to simulate and design periodic and quasi-periodic 1D, 2D and 3D nanostructures using two-beam interference technique. We designed and simulated periodic and quasi-periodic structures by two-beam interference patterning using a MATLAB program by varying angle of incidence, wavelength and geometry. The generated patterns/features depend on the interference intensity, wavelength, slit separation and angle of incidence. Using this technique, we can achieve potentially high-volume of uniformity, throughput, process control, and repeatability. By varying different input parameters, we have optimized simulated patterns with controlled periodicity, density and aspect ratio also it can be programmed to obtain images of interference results showing interference intensity distributions.