Negative-U Centers as a Basis of Topological Edge Channels
Nikolay Bagraev, Eduard Danilovskii, Wolfgang Gehlhoff, Leonid, Klyachkin, Andrey Kudryavtsev, Anna Malyarenko, Vladimir Mashkov

TL;DR
This paper investigates silicon nanostructures with negative-U boron centers that form topological edge channels exhibiting quantum spin Hall effects, spin polarization, and Aharonov-Casher oscillations, revealing new insights into topological states in silicon.
Contribution
It introduces a phenomenological model linking negative-U boron centers in silicon to topological edge channels and quantum spin Hall phenomena.
Findings
Observation of quantized conductance consistent with quantum spin Hall effect
Detection of Aharonov-Casher conductance oscillations
Evidence of spin polarization and Rashba spin-orbit interaction
Abstract
We present the findings of the studies of the silicon sandwich nanostructure that represents the high mobility ultra - narrow silicon quantum well of the p - type (Si - QW), 2 nm, confined by the delta - barriers, 3 nm, heavily doped with boron on the n - type Si (100) surface. The ESR studies show that nanostructured delta - barriers confining the Si - QW consist predominantly of the dipole negative - U centers of boron, which are caused by the reconstruction of the shallow boron acceptors along the <111> crystallographic axis, 2B(0) = B(+) + B(-). The electrically ordered chains of dipole negative - U centers of boron in the delta -barriers appear to give rise to the topological edge states separated vertically, because the value of the longitudinal, Gxx = 4e2/h, and transversal, Gxy = e2/h, conductance measured at extremely low drain-source current indicates the exhibition of the…
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