Characterization of highly anisotropic three-dimensionally nanostructured surfaces
Daniel Schmidt

TL;DR
This paper demonstrates how generalized ellipsometry can accurately characterize the geometrical and optical properties of highly anisotropic, nanostructured thin films, including during growth processes, using advanced modeling approaches.
Contribution
It introduces and compares modeling approaches for ellipsometry analysis of nanostructured thin films, enabling precise determination of structural and optical parameters.
Findings
Models agree well with SEM images
Effective medium approximations provide additional parameters
In-situ growth monitoring is feasible with these models
Abstract
Generalized ellipsometry, a non-destructive optical characterization technique, is employed to determine geometrical structure parameters and anisotropic dielectric properties of highly spatially coherent three-dimensionally nanostructured thin films grown by glancing angle deposition. The (piecewise) homogeneous biaxial layer model approach is discussed, which can be universally applied to model the optical response of sculptured thin films with different geometries and from diverse materials, and structural parameters as well as effective optical properties of the nanostructured thin films are obtained. Alternative model approaches for slanted columnar thin films, anisotropic effective medium approximations based on the Bruggeman formalism, are presented, which deliver results comparable to the homogeneous biaxial layer approach and in addition provide film constituent volume fraction…
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