ZnO, ZnMnO and ZnCoO films grown by atomic layer deposition
M.I. {\L}ukasiewicz, A. W\'ojcik-G{\l}odowska, E. Guziewicz, A., Wolska, M.T. Klepka, P. D{\l}u\.zewski, R. Jakie{\l}a, E. {\L}usakowska, K., Kopalko, W. Paszkowicz, {\L}. Wachnicki, B.S. Witkowski, W. Lisowski, M., Krawczyk, J.W. Sobczak, A. Jab{\l}o\'nski, M. Godlewski
TL;DR
This paper reviews the use of atomic layer deposition (ALD) to grow ZnO, ZnMnO, and ZnCoO films, emphasizing how ALD allows precise control over alloy uniformity, which is crucial for understanding their magnetic properties.
Contribution
It highlights the advantages of ALD in controlling the uniformity of ZnMnO and ZnCoO films, aiding in resolving magnetic property contradictions.
Findings
ALD enables precise control of alloy uniformity.
Uniform distribution affects magnetic responses.
Review of properties of ZnO, ZnMnO, ZnCoO films.
Abstract
Despite many efforts the origin of a ferromagnetic (FM) response in ZnMnO and ZnCoO is still not clear. Magnetic investigations of our samples, not discussed here, show that the room temperature FM response is observed only in alloys with a non-uniform Mn or Co distribution. Thus, the control of their distribution is crucial for explanation of contradicted magnetic properties of ZnCoO and ZnMnO reported till now. In the present review we discuss advantages of the Atomic Layer Deposition (ALD) growth method, which enables us to control uniformity of ZnMnO and ZnCoO alloys. Properties of ZnO, ZnMnO and ZnCoO films grown by the ALD are discussed.
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