Investigating individual arsenic dopant atoms in silicon using low-temperature scanning tunnelling microscopy
Kitiphat Sinthiptharakoon, Steven R. Schofield, Philipp Studer,, Veronika Br\'azdov\'a, Cyrus F. Hirjibehedin, David R. Bowler, Neil J., Curson

TL;DR
This study uses low-temperature scanning tunnelling microscopy and spectroscopy to analyze sub-surface arsenic dopants in silicon, revealing different charge states and surface features consistent with DFT predictions.
Contribution
It provides detailed imaging and characterization of arsenic dopants in silicon at the atomic level, including charge states and surface interactions, supported by DFT calculations.
Findings
As1 features are neutral in filled states and positively charged in empty states.
As2 features are negatively charged at all biases.
DFT predicts dopant-induced states near the conduction band edge.
Abstract
We study sub-surface arsenic dopants in a hydrogen terminated Si(001) sample at 77 K, using scanning tunnelling microscopy and spectroscopy. We observe a number of different dopant related features that fall into two classes, which we call As1 and As2. When imaged in occupied states the As1 features appear as anisotropic protrusions superimposed on the silicon surface topography, and have maximum intensities lying along particular crystallographic orientations. In empty-state images the features all exhibit long-range circular protrusions. The images are consistent with buried dopants that are in the electrically neutral (D0) charge state when imaged in filled states, but become positively charged (D+) through electrostatic ionisation when imaged under empty state conditions, similar to previous observations of acceptors in GaAs. Density functional theory (DFT) calculations predict that…
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Taxonomy
TopicsForce Microscopy Techniques and Applications · Advanced Electron Microscopy Techniques and Applications · Semiconductor Quantum Structures and Devices
