Nanopattern on Carbon and by Carbon

TL;DR

This paper explores nanopattern formation on carbon and silicon surfaces using low energy inert and carbon ion beams, highlighting carbon's dual role as target and projectile in creating nano structures efficiently.

Contribution

It demonstrates the novel use of carbon ion beams to form ordered silicon nano ripple structures at lower fluences, emphasizing carbon's unique role.

Findings

Carbon nanopatterns formed on carbon thin films by inert and carbon ion beams.

Carbon ion beams create well-ordered silicon nano ripple structures more efficiently.

Implanted carbon significantly influences ripple formation at lower fluences.

Abstract

We have reported nanopattern formation on carbon thin film and Si(100) surfaces by low energy inert and carbon ion beams. It is interesting to observe the role of carbon as target as well as projectile for nano patterning. Using carbon thin film as target, nano patterns of carbon are formed by inert (Ar+) and self (C+) ion bombardment, whereas carbon ion beam is used to form well ordered Si nano ripple structure in a cost effective way where implanted carbon plays an important role to form Si ripple in relatively lower fluence than the inert projectile.