New experimental setup for in situ measurement of slow ion induced sputtering

TL;DR

This paper introduces a novel experimental setup for in situ measurement of ion-induced sputtering, enabling precise analysis of sputtered particles and angular distribution without contamination, especially for light elements like carbon.

Contribution

The paper presents a new in situ apparatus that allows for contamination-free, angular-resolved sputtering measurements of various elements, including light materials, using Auger electron spectroscopy.

Findings

Successful measurement of sputtering yield and angular distribution.

Preliminary results on graphite and tungsten under specific ion energies.

Enhanced capability for studying light element sputtering.

Abstract

A new experimental equipment allowing to study the sputtering induced by ion beam irradiation is presented. The sputtered particles are collected on a catcher which is analyzed in situ by Auger electron spectroscopy without breaking the ultra high vacuum (less than 10-9mbar), avoiding thus any problem linked to possible contamination. This method allows to measure the angular distribution of sputtering yield. Thanks to this new setup it is now possible to study the sputtering of many elements especially light elements such as carbon based materials. Preliminary results are presented in the case of highly oriented pyrolytic graphite and tungsten irradiated by an Ar+ beam at respectively 2.8 keV and 7 keV.