Integration of on-chip field-effect transistor switches with dopantless Si/SiGe quantum dots for high-throughput testing
Daniel R. Ward, D. E. Savage, M. G. Lagally, S. N. Coppersmith, M. A., Eriksson

TL;DR
This paper introduces a multiplexed measurement method using on-chip FET switches to efficiently test multiple Si/SiGe quantum devices at cryogenic temperatures, improving throughput and device comparison.
Contribution
It presents a novel on-chip FET switch integration technique for high-throughput cryogenic testing of quantum dots, addressing wiring constraints and enabling scalable device characterization.
Findings
Successful multiplexed measurement of three quantum-point contact channels
Comparison of threshold and pinch-off voltages within a single cool-down
Demonstration of scalable testing approach for quantum devices
Abstract
Measurement of multiple quantum devices on a single chip increases characterization throughput and enables testing of device repeatability, process yield, and systematic variations in device design. We present a method that uses on-chip field-effect transistor switches to enable multiplexed cryogenic measurements of double quantum dot Si/SiGe devices. Multiplexing makes it feasible to characterize a number of devices that scales exponentially with the number of external wires, a key capability given the significant constraints on cryostat wiring currently in common use. We use this approach to characterize three nominally identical quantum-point contact channels, enabling comparison of their threshold voltages for accumulation and their pinch-off voltages during a single cool-down of a dilution refrigerator.
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