Atomic Calligraphy: The Direct Writing of Nanoscale Structures using MEMS

TL;DR

This paper introduces a MEMS-based method for resist-free nanoscale patterning using focused ion beam customization, enabling precise, in situ fabrication of nano-structures and circuits with potential applications in atomic-scale experiments.

Contribution

It presents a novel MEMS approach with FIB customization and a shutter system for high-precision, resist-free nanoscale patterning and in situ circuit fabrication.

Findings

Apertures as small as 50 nm were fabricated with nanometer precision.

The system allows controlled deposition of gold nanostructures.

Features ranging from nano- to micrometers can be selectively created.

Abstract

We present a micro-electromechanical system (MEMS) based method for the resist free patterning of nano-structures. Using a focused ion beam (FIB) to customize larger MEMS machines, we fabricate apertures as small as 50 nm on plates that can be moved with nanometer precision over an area greater than 20x20 {\mu}m^2. Depositing thermally evaporated gold atoms though the apertures while moving the plate results in the deposition of nanoscale metal patterns. Adding a shutter only microns above the aperture, enables high speed control of not only where but also when atoms are deposited. Using a shutter, different sized apertures can be selectively opened and closed for nano-structure fabrication with features ranging from nano- to micrometers in scale. The ability to evaporate materials with high precision, and thereby fabricate circuits and structures in situ, enables new kinds of experiments based on the interactions of a small number of atoms and eventually even single atoms.