Optical thickness determination of hexagonal Boron Nitride flakes
Dheeraj Golla, Kanokporn Chattrakun, Kenji Watanabe, Takashi, Taniguchi, Brian J. LeRoy, and Arvinder Sandhu

TL;DR
This paper demonstrates a rapid, noninvasive optical method to determine the thickness of hexagonal Boron Nitride flakes, enabling efficient characterization for nanodevice applications.
Contribution
It introduces a simple optical contrast technique for measuring hBN thickness, calibrated against atomic force microscopy, for the first time.
Findings
Optical contrast shows a strong negative peak at short wavelengths.
Contrast varies linearly with 1-80 layers of hBN.
Method allows quick calibration of hBN thickness.
Abstract
Optical reflectivity contrast provides a simple, fast and noninvasive method for characterization of few monolayer samples of two-dimensional materials. Here we apply this technique to measure the thickness of thin flakes of hexagonal Boron Nitride (hBN), which is a material of increasing interest in nanodevice fabrication. The optical contrast shows a strong negative peak at short wavelengths and zero contrast at a thickness dependent wavelength. The optical contrast varies linearly for 1-80 layers of hBN, which permits easy calibration of thickness. We demonstrate the applicability of this quick characterization method by comparing atomic force microscopy and optical contrast results.
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Taxonomy
TopicsGraphene research and applications · Diamond and Carbon-based Materials Research · Advancements in Semiconductor Devices and Circuit Design
