Highly reproducible metal/graphene contacts and stable electrical performance by UV-Ozone treatment
Wei Li, Christina A. Hacker, Yiran Liang, Curt A. Richter, David J., Gundlach, Xuelei Liang, and Lianmao Peng

TL;DR
This paper demonstrates that UV-Ozone treatment effectively cleans metal/graphene contacts, resulting in highly reproducible, stable, and low contact resistance without damaging the graphene, improving device reliability.
Contribution
It introduces UV-Ozone treatment as a novel method to clean metal/graphene interfaces, enhancing contact reproducibility and stability compared to traditional methods.
Findings
UV-Ozone treatment reduces contact resistance
Contacts show high reproducibility across devices
Electrical properties of graphene remain unaffected
Abstract
Resist residue from the device fabrication process is a general and significant source of the metal/graphene contact interface contamination. In this paper, Ultraviolet-Ozone (UVO) treatment is proven to be an effective way of cleaning the metal/graphene interface. Electrical measurements of devices, which were fabricated by using UVO treatment of the metal/graphene contact region, show that stable and highly reproducible low contact resistance between metal and graphene is obtained without affecting the electrical properties of the graphene channel itself.
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Taxonomy
TopicsGraphene research and applications · Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis
