Atomistic Boron-Doped Graphene Field Effect Transistors: A Route towards Unipolar Characteristics
Paolo Marconcini, Alessandro Cresti, Francois Triozon, Gianluca Fiori,, Blanca Biel, Yann-Michel Niquet, Massimo Macucci, Stephan Roche

TL;DR
This study uses advanced quantum simulations to explore how boron doping in graphene transistors can lead to more unipolar behavior and tunable electronic properties, providing a new modeling approach for doped graphene devices.
Contribution
The paper introduces a comprehensive simulation framework combining DFT and NEGF to accurately model boron-doped graphene transistors at the atomistic level, enabling tunability analysis.
Findings
Boron doping approaches unipolar behavior in graphene transistors.
Chemical dopant density controls electron-hole transport asymmetry.
A mobility gap emerges with increased boron concentration.
Abstract
We report fully quantum simulations of realistic models of boron-doped graphene-based field effect transistors, including atomistic details based on DFT calculations. We show that the self-consistent solution of the three-dimensional (3D) Poisson and Schr\"odinger equations with a representation in terms of a tight-binding Hamiltonian manages to accurately reproduce the DFT results for an isolated boron-doped graphene nanoribbon. Using a 3D Poisson/Schr\"odinger solver within the Non-Equilibrium Green's Functions (NEGF) formalism, self-consistent calculations of the gate-screened scattering potentials induced by the boron impurities have been performed, allowing the theoretical exploration of the tunability of transistor characteristics. The boron-doped graphene transistors are found to approach unipolar behavior as the boron concentration is increased, and by tuning the density of…
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