High-voltage nanosecond pulses in a low-pressure radiofrequency discharge
Mikhail Pustylnik, Lujing Hou, Alexei Ivlev, Leonid Vasilyak, Lenaic, Cou\"edel, Hubertus Thomas, Gregor Morfill, Vladimir Fortov

TL;DR
This study investigates how high-voltage nanosecond pulses affect low-pressure RF argon plasma, revealing a two-phase response with a bright flash and a subsequent dark phase, supported by experimental and simulation analysis.
Contribution
It demonstrates the impact of nanosecond pulses on plasma dynamics and elucidates the mechanisms behind the flash and dark phases through combined experiments and simulations.
Findings
High-voltage pulses cause a bright flash with increased emission.
Residual electrons and secondary emissions drive plasma excitation.
High-density plasma screens RF fields, leading to the dark phase.
Abstract
An influence of a high-voltage (3-17 kV) 20 ns pulse on a weakly-ionized low-pressure (0.1-10 Pa) capacitively-coupled radiofrequency (RF) argon plasma is studied experimentally. The plasma evolution after pulse exhibits two characteristic regimes: a bright flash, occurring within 100 ns after the pulse (when the discharge emission increases by 2-3 orders of magnitude over the steady-state level), and a dark phase, lasting a few hundreds \mu s (when the intensity of the discharge emission drops significantly below the steady-state level). The electron density increases during the flash and remains very large at the dark phase. 1D3V particle-in-cell simulations qualitatively reproduce both regimes and allow for detailed analysis of the underlying mechanisms. It is found that the high-voltage nanosecond pulse is capable of removing a significant fraction of plasma electrons out of the…
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