Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors

TL;DR

This paper presents a method for fabricating high-quality sub-micron gold gratings over large areas using pulsed laser interference lithography, suitable for enhancing surface plasmon resonance sensors.

Contribution

It introduces a novel fabrication process combining laser interference lithography with gold film transfer to produce high-quality plasmonic gratings.

Findings

Achieved gold gratings with 770 nm period and 20-60 nm height

Demonstrated plasmonic resonance response in fabricated gratings

Established a scalable method for large-area grating fabrication

Abstract

Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.