Measurement of mobility in dual-gated MoS2 transistors
Michael S. Fuhrer, James Hone

TL;DR
This paper investigates the measurement techniques of mobility in dual-gated MoS2 transistors, highlighting discrepancies and potential overestimations in reported mobility values, and emphasizes the importance of accurate measurement methods for reliable device characterization.
Contribution
The study provides a detailed analysis of measurement techniques in dual-gated MoS2 transistors, identifying sources of overestimation and proposing more accurate assessment methods.
Findings
Double-gated measurements often overestimate mobility due to measurement artifacts.
Significant discrepancy exists between top-gate and back-gate mobility measurements.
Proper measurement techniques are crucial for accurate mobility evaluation in MoS2 devices.
Abstract
Atomically thin semiconducting MoS2 is of great interest for high-performance flexible electronic and optoelectronic devices. Initial measurements using back-gated field-effect transistor (FET) structures on SiO2 yielded mobility of 1-50 cm^2/Vs for few-layer MoS2[1, 2]. Initial measurements using back-gated field-effect transistor (FET) structures on SiO2 yielded mobility of 1-50 cm^2/Vs for few-layer MoS2[1, 2]. However, greatly increased mobility - as high as 900 cm^2/Vs - was recently reported for monolayer MoS2 by Radisavljevic, et al.[Ref. 3; see also Refs. 4-6], and for multilayer MoS2 by others[7, 8], in devices covered by a high-kappa dielectric layer and a metal top gate. Similar increases were reported for electrolyte top-gated MoS2[9]. A puzzling common aspect of these reports is that the double-gated devices consistently show much higher mobility when measured using the…
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