Multiphoton electron detachment by a superposition of static and ac filds

TL;DR

This paper develops a theoretical framework for electron detachment caused by combined static and ac fields, providing analytical results and identifying different detachment regimes with applications to various surfaces and bio-complexes.

Contribution

It introduces a new theory for multiphoton electron detachment under combined static and ac fields with explicit analytical solutions and validity conditions.

Findings

Multiple detachment regimes identified

Analytical formulas derived for electron emission

Applications to metal, semiconductor, and bio-complex surfaces

Abstract

A theory of electron detachment from atoms or negative ions by a superposition of a static and a laser (or, more generally, ac) fields, parallel to each other, is developed in the case when the photon energy and the field amplitude are much less than the detachment energy and intra-ion field, respectively. Simple analytical results together with their validity conditions are obtained. Several qualitatively different regimes of detachment have been identified. Applications of the present theory to electron emission from metal and semiconductor surfaces and from photosynthetic bio-complexes are discussed.