A wide band gap metal-semiconductor-metal nanostructure made entirely from graphene
J. Hicks, A. Tejeda, A. Taleb-Ibrahimi, M. S. Nevius, F. Wang, K., Shepperd, J. Palmer, F. Bertran, P. Le F\`evre, J. Kunc, W. A. de Heer, C., Berger, E. H. Conrad

TL;DR
This paper presents a scalable bottom-up method to produce atomically precise semiconducting graphene regions integrated within metallic graphene, using substrate interactions to control electronic properties without lithography.
Contribution
It introduces a novel approach to create atomically precise graphene junctions by exploiting substrate interactions, avoiding traditional lithographic limitations.
Findings
Produced a scalable, reproducible graphene junction with precise width control.
Demonstrated a semiconducting region with >0.5 eV energy gap within metallic graphene.
Showed minimal variation in electronic structure over tens of microns.
Abstract
A blueprint for producing scalable digital graphene electronics has remained elusive. Current methods to produce semiconducting-metallic graphene networks all suffer from either stringent lithographic demands that prevent reproducibility, process-induced disorder in the graphene, or scalability issues. Using angle resolved photoemission, we have discovered a unique one dimensional metallic-semiconducting-metallic junction made entirely from graphene, and produced without chemical functionalization or finite size patterning. The junction is produced by taking advantage of the inherent, atomically ordered, substrate-graphene interaction when it is grown on SiC, in this case when graphene is forced to grow over patterned SiC steps. This scalable bottomup approach allows us to produce a semiconducting graphene strip whose width is precisely defined within a few graphene lattice constants, a…
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