Field-effect diode based on electron-induced Mott transition in NdNiO3
W. L. Lim, E. J. Moon, J. W. Freeland, D. J. Meyers, M. Kareev, J., Chakhalian, S. Urazhdin

TL;DR
This paper investigates a two-terminal device using NdNiO3 to study electron-induced metal-insulator transition, revealing temperature-dependent asymmetry and history effects in conductivity, advancing understanding of electron doping in correlated oxides.
Contribution
It introduces a simple two-terminal device to explore electron doping effects on the Mott transition in NdNiO3, highlighting the role of electrostatic doping and history dependence.
Findings
Asymmetric conductivity dependent on bias polarity
Temperature-sensitive asymmetry near transition
History-dependent I-V characteristics
Abstract
We studied an electron-induced metal-insulator transition in a two-terminal device based on oxide NdNiO3. In our device, the NdNiO3 is electrostatically doped by the voltage applied between the terminals, resulting in an asymmetric conductivity with respect to the bias polarity. The asymmetry is temperature-dependent and is most significant near the metal-insulator transition. The I-V characteristics exhibit a strong dependence both on the thermal history and the history of the applied voltage bias. Our two-terminal device represents a simple and efficient route for studies of the effect of electron doping on the metal-insulator transition.
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