A new method to correct deformations in emulsion using a precise photomask

TL;DR

This paper introduces a novel correction method for emulsion deformations using a precise photomask, significantly improving positional accuracy in nuclear emulsion tracking for experiments with limited reference tracks.

Contribution

The paper presents a new correction technique employing a precise photomask to recover high accuracy in emulsion tracking, especially useful with few reference tracks.

Findings

Achieved 0.6 μm position measurement accuracy over 5 cm x 7 cm area.

Enabled submicron accuracy in track segment measurements with minimal reference tracks.

Applicable to underground hybrid emulsion experiments with limited reference data.

Abstract

A new method to correct the emulsion deformation, mainly produced in the development process, is developed to recover the high accuracy of nuclear emulsion as a tracking device. The method is based on a precise photomask and a careful treatment of the emulsion films. A position measurement accuracy of 0.6 {\mu}m is obtained over an area of 5 cm x 7 cm. The method allows to measure positions of track segments with submicron accuracy in an ECC brick with as few as 10 reference tracks for alignment. Such a performance can be important for hybrid emulsion experiments at underground laboratories where only a small number of reference tracks for alignment are available.