A Semiconductor Under Insulator Technology in Indium Phosphide
Khaled Mnaymneh, Dan Dalacu, Simon Fr\'ed\'erick, Jean Lapointe,, Philip J. Poole, Robin L. Williams
TL;DR
This paper introduces a novel Semiconductor-Under-Insulator (SUI) technology in InP that enhances optical transmission and enables advanced fiber-coupling techniques in photonic crystal membrane structures.
Contribution
The paper presents the first implementation of InP-SUI technology, improving optical performance and compatibility with fiber-coupling methods in III-V photonic systems.
Findings
Significant improvement in optical transmission with InP-SUI waveguides.
InP-SUI supports fiber-coupling techniques similar to SOI.
Enables integration of photonic crystal membrane structures.
Abstract
This Letter introduces a Semiconductor-Under-Insulator (SUI) technology in InP for designing strip waveguides that interface InP photonic crystal membrane structures. Strip waveguides in InP-SUI are supported under an atomic layer deposited insulator layer in contrast to strip waveguides in silicon supported on insulator. We show a substantial improvement in optical transmission when using InP-SUI strip waveguides interfaced with localized photonic crystal membrane structures when compared with extended photonic crystal waveguide membranes. Furthermore, SUI makes available various fiber-coupling techniques used in SOI, such as sub-micron coupling, for planar membrane III-V systems.
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